Extreme ultraviolet lithography photograph

Extreme Ultraviolet Lithography

Use attributes for filter !
Date of Reg.
Date of Upd.
ID2310674
Send edit request

About Extreme Ultraviolet Lithography

Extreme ultraviolet lithography is a next-generation lithography technology using a range of extreme ultraviolet wavelengths, roughly spanning a 2% FWHM bandwidth about 13. 5 nm. In August 2019, Samsung announced the use of EUV for its own 7nm Exynos 9825 chip. However, yield issues have been a concern.

Extreme ultraviolet lithography Photos

Next Profile ❯